Semiconductor Manufacturing
Doe & Ingalls offers performance and wet process chemicals to support semiconductor manufacturing, from cleaning, to front-end and back-end wafer-building processes.
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Performance Chemistry |
Wet Process Chemicals |
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| BakerClean® | Ammonium Hydroxide | ||
| JTB | Ethanol (Ethyl Alcohol) | ||
| Clean 100TM | Hydrochloric Acid | ||
| Clean 111TM | Hydrofluoric Acid | ||
| Summa Clean® | Hydrogen Peroxide | ||
| Methanol | |||
| 1-Propanol | |||
| 2-Propanol | |||
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Performance Chemistry |
Complementary Products |
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| JSR Micro | Butyl Acetate | ||
| IX Series I-line Positive Resists | Ethyl Acetate | ||
| NFR Series I-line Negative Resists | Dioxolane | ||
| THB Series Resists | Ethyl Lactate | ||
| Hexamethyldisilizane (HMDS) | |||
| Propylene Glycol Monomethyl Ether | |||
| Acetate (PGMEA) | |||
| Performance Chemistry |
Wet Process Chemicals |
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| JSR Micro | Cyclohexanone | ||
| PD523AD Developer | Dioxolane | ||
| TMAH-based | Mesitylene | ||
| Potassium Hydroxide | |||
| Sodium Hydroxide | |||
| Tetramethylammonium Hydroxide (TMAH) | |||
| Toluene | |||
| Xylene | |||
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Etch Chemistry |
Wet Process Chemicals |
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| Aluminum Etch | Acetic Acid | ||
| Buffered Oxide Etch | Ammonium Fluoride | ||
| Chrome Etch | Ammonium Hydroxide | ||
| Copper Etch | Citric Acid | ||
| Gold Etch | Ethylene Glycol | ||
| Ferric Nitrate | |||
| Hydrochloric Acid | |||
| Hydrofluoric Acid | |||
| Hydrogen Peroxide | |||
| Nitric Acid | |||
| Phosphoric Acid | |||
| Potassium Hydroxide | |||
| Potassium Iodide | |||
| Sodium Hydroxide | |||
| Succinic Acid | |||
| Additional metal etches available as requested. | |||
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Performance Chemistry |
Wet Process Chemicals |
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| Air Products | Dimethylsulfoxide (DMSO) | ||
| ACT® Series | Dimethylformamide (DMF) | ||
| NE Series | Dimethylacetamide (DMAC) | ||
| ATMI IDEAL Clean® | Dioxolane | ||
| Cyantek | Ethylene Glycol | ||
| Nanostrip | g-Butyrolactone | ||
| NRS Series | Methyl Ethyl Ketone (MBK) | ||
| RS Series | Methyl Isobutyl Ketone (MIBK) | ||
| J.T. Baker® | Methyl Isoamyl Ketone (MIAK) | ||
| PRS-1000® | N-Methyl Pyrrolidinone (NMP) | ||
| PRS-2000® | Sulfuric Acid / Hydrogen Peroxide | ||
| PRS-3000® | |||
| ALEG® Line | |||
| CLK® Line | |||
| REZI® Line | |||